AX2600 and AX2700 Microwave Plasma Subsystems
Model: AX2600-AX2700
AX2600 and AX2700 Microwave Plasma Subsystems
Model: AX2600-AX2700

Overview
Overview
The AX2600 and AX2700 Series Microwave Plasma Delivery Subsystems are complete and highly reliable solutions for the cost-effective generation and safe delivery of atomic species to the wafer. Available in 1.8 kW or 3 kW, the highly reliable, field-proven AX2600 and AX2700 Series plasma delivery subsystems deliver highly concentrated atomic species. Suitable for multiple chemistries, the high speed and precision of this plasma system’s automatic tuning guarantees immediate ignition and fast transition from plasma conditions for high productivity. Robust closed-loop control ensures high accuracy, precision, and optimal repeatability of the process from wafer to wafer and system to system. The AX2600 Series is a fully integrated, “packaged” solution designed for easy on-chamber integration. The AX2600 system includes the AX2500 SmartPower® Microwave Generator, SmartMatch® Tuner, Isolator, and the patented AX7610 Microwave Applicator. The AX2700 Series, provided in kit form, consists of all components necessary for microwave plasma processing and is ideal for customers looking to optimize placement of the individual components on a system. All AX2700 system components are highly reliable, factory tested, and field-proven.
Technical Specs
- TypeMicrowave Plasma Subsystem
- Power Output1.8 or 3.0 kW
- Frequency2,440 - 2,470 MHz
- Output Accuracy±1.5% (from 20 - 100% of max. power)
- Power Requirements200/208 VAC ±10%, 3 phase, 50/60 Hz
- ChemistriesO2, N2, H2O, Ar, NF3, CF4, C2F6, NH3
- Applicator MaterialQuartz or Sapphire
- Operating Pressure2 - 8 Torr
- ComplianceCE, ETL, SEMI S2-93A, SEMI F47
- Time to Match<2 sec
- RegulationBetter than 1% of output power (line and load)
- Total Gas Flow1 – 7 slm
- Remote ControlAnalog, RS485, DeviceNet™ EtherCAT®
Technical Specs
- TypeMicrowave Plasma Subsystem
- Power Output1.8 or 3.0 kW
- Frequency2,440 - 2,470 MHz
- Output Accuracy±1.5% (from 20 - 100% of max. power)
- Power Requirements200/208 VAC ±10%, 3 phase, 50/60 Hz
- ChemistriesO2, N2, H2O, Ar, NF3, CF4, C2F6, NH3
- Applicator MaterialQuartz or Sapphire
- Operating Pressure2 - 8 Torr
- ComplianceCE, ETL, SEMI S2-93A, SEMI F47
- Time to Match<2 sec
- RegulationBetter than 1% of output power (line and load)
- Total Gas Flow1 – 7 slm
- Remote ControlAnalog, RS485, DeviceNet™ EtherCAT®
