The AX7610S downstream microwave plasma source is for remote plasma applications with replaceable sapphire plasma tube ideally suited for more severe CF4 CHF3 and NF3 chemistries. The AX7610 downstream source offers configuration flexibility to meet the most demanding application process parameters. The patented conductively-cooled design of the plasma tube supports high throughput and high power (up to 3kW) operation. The wide process window allows for AX7610 use in multiple applications, ranging from fast PR and polymer removal from 300mm wafers to fine-control low-k or atomic layer CVD processes.