The HMPSQ-MKS High Power Microwave Plasma Source has a sapphire plasma tube, and can be combined with a 6kW microwave generator for a high concentration of radicals capable of igniting in multiple process gases, over a wide operating range for applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level. The High Power Microwave Plasma Source can be combined with a 6kW microwave generator for a high concentration of radicals providing a high productivity manufacturing solution. The High Power Microwave Plasma source is capable of igniting in multiple process gases, over a wide operating range with performance benefits in current and emerging applications such as, high throughput photoresist removal, advanced surface cleaning and conditioning, as well as, advanced deposition applications at the atomic level. The High Power Microwave Plasma Source is ideal for use with MKS microwave plasma systems, comprised of an MKS microwave power generator, waveguide components, and the advanced SmartMatch® intelligent matching unit. Designed with a high efficiency field replaceable plasma applicator, this new microwave plasma source delivers optimal cost of ownership advantages.