AX8415 Ultra High Concentration, High Flow Ozone Generator
AX8415 Ultra High Concentration, High Flow Ozone Generator
The AX8415 is the most innovative and versatile ozone generator developed by MKS. Ultra clean, ultra high concentration, high flow ozone is produced by this generator’s novel architecture and patented cell design, converting oxygen to > 400 g/Nm3 of high concentration ozone for leading-edge applications in the semiconductor, flat panel display, and photovoltaic industries. The technology designed into the AX8415 is the basis of this generator’s versatility. Product Features Ozone is used in the formation of CVD and ALD thin films, oxide growth, photoresist removal, and multiple cleaning applications. The AX8415 has the capability to support all these applications by producing the highest concentrations of ultra clean ozone with or without the addition of nitrogen as a dopant gas. Removing the minute amount of nitrogen used in the formation of ozone eliminates the formation of NOx compounds, if required for a given application.
- Ozone concentration up to 425 g/Nm3 or 27.1 wt% at 5°C @ 2.5 slm
- O2 flow rate from 2.5 slm to 50 slm enables process flexibility
- Patented cell design enables production of high concentration ozone
- Operational with or without the addition of nitrogen
- Closed-loop operation for tighter process control
- Direct replacement for MKS AX8407 ozone generator See All Features
| Compare | Description | Drawings, CAD & Specs | Avail. | Price | ||
|---|---|---|---|---|---|---|
 | AX8415Ozone Gas Generator, 2.5 - 50 slm, Ultra Clean, High Concentration, High Flow |
Specifications
- TypeOzone Gas Generator
- Ozone Outputup to 425 g/Nm3
- Flow Rate2.5 - 50 slm
- Feed GasOxygen: Grade 6 or better O2
Nitrogen (Optional): 100 ppm Grade 5 or better N2 - Ambient Temperature10 - 40°C (50 - 104°F)
- Nominal Cell Pressure (Delivery)15 - 45 psig (100 - 310 kPa)
- PressureMaintain process pressure at 20 - 50 psig
- Control InterfaceFront panel control and remote operation
- Cooling Water Temperature5 - 25°C (41 - 77°F)
- Cooling Water Filtration100 microns
- Cooling Water QualityResistivity ≥ 50 kΩ/cm
- Minimum Water Flow9.4 lpm (2.5 gpm)
- Voltage Requirements208 VAC (±10%) 3Ø & GND, no neutral
- Current Requirements20 Amp
- Frequency50/60 Hz
- Weight46.3 kg (102 lbs)
- Dimensions483 x 445 x 267 mm (19.0 x 17.5 x 10.5 in)
- ComplianceCE, SEMI S2-0302, SEMI F47, UL 61010-1, CAN/CSA-61010-1
Features
Highest Concentrations of Ultra Clean Ozone
The technology designed into the AX8415 is the basis of this generator’s versatility. Ozone is used by the electronics industry in the formation of CVD and ALD thin films, oxide growth, photoresist removal and multiple cleaning applications. The AX8415 has the capability to support all these applications by producing the highest concentrations of ultra clean ozone with or without the addition of nitrogen as a dopant gas. Removing the minute amount of nitrogen used in the formation of ozone eliminates the formation of NOx compounds, if required for a given application.
Direct Replacement for AX8407
The unique features and benefits of the AX8415 position it as a direct replacement for the industry leading AX8407 ozone generator. The form factor and connections required to produce and control ozone generation on the AX8415 are exactly the same as the AX8407. The superior performance of AX8415 is immediately available for all applications qualified with the AX8407 ozone generator.
Resources
Literature
AX8415 Ultra High Concentration, High Flow Ozone Generator(499.1 kB, PDF)
Drawings & CADs
AX8415 Ozone Generator Dimensional Drawings(374.5 kB, PDF)
Application Notes
Ozone Data Conversion Tables(289.1 kB, PDF) Ozone Applications in Atomic Layer Processing(1.7 MB, PDF)
Technical Papers
Ozone Applications for Atomic Layer Processing(1.5 MB, PDF)
