Ozone has many advantages over other oxidizers as a strong oxidizing agent. Ozone has a high redox potential, can be generated at the point-of-use, and it decays naturally into oxygen (2O3 ⇒ 3O2). Therefore, it is considered a "green" chemical. If required, ozone can also be destroyed at the output of the process chamber using a catalytic or thermal destruct unit. This significantly lowers the chemical disposal cost, as the output is oxygen and contains no ozone. Ozone is very stable at room temperature, making it a good choice for most applications. Typical ozone applications include atomic layer deposition (ALD), chemical vapor deposition (CVD), photoresist strip, wafer cleaning, contaminant removal, surface conditioning, and oxide growth.

The AX8575 system is configurable with up to four (4) independent channels to support multiple tools or chambers concurrently. Each channel can be matched to the specific concentration and flow required for your specific process. For ultra high concentration processes the system can be configured for up to two (2) channels with an in-rack chiller thereby maintaining the same footprint. The ozone source for each channel is the production-proven AX8415 series ozone generators. It incorporates MKS patented, field proven, high concentration, ultra clean ozone generation technology. The AX8580 includes all subassemblies required for stand-alone operation, including power distribution, an ambient ozone safety monitor and status indicator panel. For ozone performance of each output channel, refer to Figures 1 and 2.